Ion Track Technology


Reimar Spohr

PostHeaderIcon Influence of surfactant


Influence of surfactant on track etching

Etching (progressing from left to right) in the presence of surfactant molecules. As soon as the molecules are able to penetrate into the etched channel, they form a protecting monolayer decreasing the radial etch attack. In this way nearly cylindrical channels are formed.


This work was stimulated by a collaboration between GSI Darmstadt and JINR Dubna (Russia), initiated by Christoph Schmelzer and Georgij Nikolaevich Flerov.