Ion Track Technology


Reimar Spohr

PostHeaderIcon Abstract

Observation of etched tracks in an amorphous metal. C. Trautmann, S. Andler, W. Brüchle, R. Spohr, M. Toulemonde. Radiation Effects and Defects in Solids, vol. 126, pp. 207-210, (1993).

Latent tracks in amorphous metallic Fe81Bi13.5Si3.5C2 were selectively etched in 0.1 to 0.8 n HCl and in 0.04 n FeCl3. Etch pits with cone opening angles around 60° were observed. Tilted ion beams lead to tilted tracks.