Ion Track Technology


Reimar Spohr

PostHeaderIcon Abstract

Heavy Ion Microlithography - A New Tool to Generate and Investigate Submicroscopic Structures. B.E. Fischer, R. Spohr. Nuclear Inst. and Methods 168, pp. 241 - 246, (1980).

A shadow cast technique is presented which generates relief like replicas of submicroscopic objects using irradiation by accelerated heavy ions followed by an etching step (nuclear track etch technique). Some applications to the investigation of biological objects and to the technology of microelectronics are demonstrated. Distinctive advantages over existing X-ray technique are
1) Small accelerators/implanters can be successfully employed.
2) The technique offers high density contrast due to the well defined ion range.
3) A nearly unlimited range of materials can be directly structured by the technique.