Ion Track Technology

PhysicsConsult

Reimar Spohr

PostHeaderIcon Abstract

Micromachining by ion track lithography. Thornell, Greger; Spohr, Reimar; Van Veldhuizen, Elbert Jan; Hjort, Klas . Sens. Actuators, A (1999), A73(1-2), 176-183 .

Micromachining by ion track etching (MITE) based on the lithog. projection of a mask onto an arbitrary ion track recording material using a parallel beam of highly energetic heavy ions, is described. Deep microstructures were produced in single cryst. quartz, phlogopite mica, polycarbonate, polyimide, and soda lime glass without any photolithog. masking. Also, with a semitransparent mask, depth modulation and neg. resist characteristics can be produced. Edge definition and surface smoothness increased with increasing ion fluence.