Ion Track Technology


Reimar Spohr

PostHeaderIcon Abstract

Method for fabricating large area field emitters. Reimar Spohr United States Patent 4338164 (1982)

A method is described for producing planar surfaces having very fine peaks. The method can be used to generate large area field emission electrodes. The technique uses the following steps: (1) A sheet of the planar dielectric material is irradiated with energetic high energy ions. (2) The resulting latent ion tracks are etched, whereby each latent ion track results in a conical etch pit. (3) The etch pits are filled with a metal or semiconductor. (4) Optionally a thin film with high electron emission yield is deposited.